Task:
Quantification of the elemental composition and determination of the element oxidation states within the sample surface.
Specific information on the method:
- Maximum information depth: 5nm
- limit of detection down to 1at%
- elements: Li upwards
Specific information on the equipment/instrumentation:
Measurement in UHV as well as near ambient conditions (up to 50mbar), sample heating up to 1200°C, in-situ cleaving and Ar+ etching, possible gases: H2, O2, H2O, CO2, CO, SO2, Ar, N2
Samples/limitations:
Suitable for solids or powders, conductive samples as well as insulators,
Limitation: samples stable under UHV conditions
Examples of typical analytical questions:
- Studying high-T Corrosion on Fe-Cr alloys with near ambient pressure XPS
- Determination of oxidation states of Pt, Ir and Pd for catalysis with XPS
- Investigation of interfacial layer compounds of high-k gate dielectrics with XPS
Fields of research:
Materials for fuel cells, batteries, catalysis and electronic devices (e.g. transistors), high-T alloys